AIP Advances (Oct 2014)

Ferroelectric gate tunnel field-effect transistors with low-power steep turn-on

  • M. H. Lee,
  • Y.-T. Wei,
  • J.-C. Lin,
  • C.-W. Chen,
  • W.-H. Tu,
  • M. Tang

DOI
https://doi.org/10.1063/1.4898150
Journal volume & issue
Vol. 4, no. 10
pp. 107117 – 107117-6

Abstract

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Using a ferroelectric PbZrTiO3 gate stack, the range of the steep subthreshold swing in tunnel field-effect transistors was extended by 3.5 orders of magnitude demonstrating an improvement in the swing (by approximately double the slope). The drain conductance (gd) shows only 16% enhancement with large V DS (∼−1.5V) indicates internal voltage amplification with ferroelectric negative capacitance effect beneficial to small lateral drain-source bias voltages (−0.1 V). The concept of coupling the ferroelectric polarization is proposed. The power consumption is also discussed in low-power applications of steep subthreshold slope devices.