Effect of a Photolithography Polymer Mask’s Dynamic Viscoelasticity on Microchannel Cross-Sectional Shapes of Glass Processed by Micropowder Blasting

Abstract

In this study, a micropowder blasting system with varying processing temperatures was proposed to control the cross-sectional shape of a channel processed on a glass substrate. Based on an analysis of the processing temperature-dependence of the dynamic viscoelastic properties of a commercial mask material for micropowder blasting, a processing temperature control system that can be installed in a micropowder blasting machine was designed. The erosion of the mask during micropowder blasting depended on the loss tangent in dynamic viscoelasticity, and showed a maximum value at a processing temperature of 100 °C. Moreover, we confirmed that the maximum decrease in the width of the processed microchannel was 30 µm (12%) by mask erosion, and this change was large compared with the maximum change in the thickness of the eroded mask. These results clarified that varying the processing temperature using a mask could control the cross-section of the processed line pattern profile on glass, and a small-width channel was realized at a processing temperature of 109 °C.

Keywords

• microchannels
• photolithography
• processing
• erosion
• viscoelasticity