ACS Omega (Jun 2021)

Molecular Dynamics Simulation of Silicon Dioxide Etching by Hydrogen Fluoride Using the Reactive Force Field

  • Dong Hyun Kim,
  • Seung Jae Kwak,
  • Jae Hun Jeong,
  • Suyoung Yoo,
  • Sang Ki Nam,
  • YongJoo Kim,
  • Won Bo Lee

DOI
https://doi.org/10.1021/acsomega.1c01824
Journal volume & issue
Vol. 6, no. 24
pp. 16009 – 16015

Abstract

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