ACS Omega
(Jun 2021)
Molecular Dynamics Simulation of Silicon Dioxide Etching by Hydrogen Fluoride Using the Reactive Force Field
- Dong Hyun Kim,
- Seung Jae Kwak,
- Jae Hun Jeong,
- Suyoung Yoo,
- Sang Ki Nam,
- YongJoo Kim,
- Won Bo Lee
Affiliations
- Dong Hyun Kim
- School of Chemical and Biological Engineering, Institute of Chemical Processes, Seoul National University, Seoul, Republic of Korea
- Seung Jae Kwak
- School of Chemical and Biological Engineering, Institute of Chemical Processes, Seoul National University, Seoul, Republic of Korea
- Jae Hun Jeong
- School of Chemical and Biological Engineering, Institute of Chemical Processes, Seoul National University, Seoul, Republic of Korea
- Suyoung Yoo
- Samsung Electronics, Hwaseong, Gyeonggi, Republic of Korea
- Sang Ki Nam
- Samsung Electronics, Hwaseong, Gyeonggi, Republic of Korea
- YongJoo Kim
- School of Advanced Materials Engineering, Kookmin University, Seoul, Republic of Korea
- Won Bo Lee
- School of Chemical and Biological Engineering, Institute of Chemical Processes, Seoul National University, Seoul, Republic of Korea
- DOI
-
https://doi.org/10.1021/acsomega.1c01824
- Journal volume & issue
-
Vol. 6,
no. 24
pp.
16009
– 16015
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