Molecular Dynamics Simulation of Silicon Dioxide Etching by Hydrogen Fluoride Using the Reactive Force Field

• Dong Hyun Kim,
• Seung Jae Kwak,
• Jae Hun Jeong,
• Suyoung Yoo,
• Sang Ki Nam,
• YongJoo Kim,
• Won Bo Lee

Affiliations

Dong Hyun Kim

School of Chemical and Biological Engineering, Institute of Chemical Processes, Seoul National University, Seoul, Republic of Korea

Seung Jae Kwak

School of Chemical and Biological Engineering, Institute of Chemical Processes, Seoul National University, Seoul, Republic of Korea

Jae Hun Jeong

School of Chemical and Biological Engineering, Institute of Chemical Processes, Seoul National University, Seoul, Republic of Korea

Suyoung Yoo

Samsung Electronics, Hwaseong, Gyeonggi, Republic of Korea

Sang Ki Nam

Samsung Electronics, Hwaseong, Gyeonggi, Republic of Korea

YongJoo Kim

School of Advanced Materials Engineering, Kookmin University, Seoul, Republic of Korea

Won Bo Lee

School of Chemical and Biological Engineering, Institute of Chemical Processes, Seoul National University, Seoul, Republic of Korea