Nanoscale Research Letters (Jun 2018)

Effect of Enhanced Thermal Stability of Alumina Support Layer on Growth of Vertically Aligned Single-Walled Carbon Nanotubes and Their Application in Nanofiltration Membranes

  • Jung Bin In,
  • Kang Rae Cho,
  • Tung Xuan Tran,
  • Seok-Min Kim,
  • Yinmin Wang,
  • Costas P. Grigoropoulos,
  • Aleksandr Noy,
  • Francesco Fornasiero

DOI
https://doi.org/10.1186/s11671-018-2585-3
Journal volume & issue
Vol. 13, no. 1
pp. 1 – 9

Abstract

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Abstract We investigate the thermal stability of alumina supporting layers sputtered at different conditions and its effect on the growth of aligned single-walled carbon nanotube arrays. Radio frequency magnetron sputtering of alumina under oxygen–argon atmosphere produces a Si-rich alumina alloy film on a silicon substrate. Atomic force microscopy on the annealed catalysts reveals that Si-rich alumina films are more stable than alumina layers with low Si content at the elevated temperatures at which the growth of single-walled carbon nanotubes is initiated. The enhanced thermal stability of the Si-rich alumina layer results in a narrower (< 2.2 nm) diameter distribution of the single-walled carbon nanotubes. Thanks to the smaller diameters of their nanotube pores, membranes fabricated with vertically aligned nanotubes grown on the stable layers display improved ion selectivity.

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