Design and fabrication of robust broadband extreme ultraviolet multilayers
Shang-qi Kuang,
Jian-bo Wang,
Hai-gui Yang,
Tong-lin Huo,
Hong-jun Zhou
Affiliations
Shang-qi Kuang
School of Science, Changchun University of Science and Technology, Changchun 130022, China
Jian-bo Wang
School of Science, Changchun University of Science and Technology, Changchun 130022, China
Hai-gui Yang
Advanced Manufacturing Technology for Optical Systems Laboratory, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun 130033, China
Tong-lin Huo
Synchrotron Radiation Laboratory, University of Science and Technology of China, Hefei 230029, China
Hong-jun Zhou
Synchrotron Radiation Laboratory, University of Science and Technology of China, Hefei 230029, China
The robust designs of broadband extreme ultraviolet multilayers based on the multiobjective genetic algorithm are validated experimentally. In order to reduce the influence of random layer thickness fluctuations on the great deformation of the experimental reflection of extreme ultraviolet multilayer with a wide angular band, the multiobjective genetic algorithm has been improved to optimize the multilayer system composed by the layer thicknesses which can be controlled precisely. The robust designs of broadband Mo/Si multilayers were fabricated, and the experimental results were presented and analyzed, and then the advantage of robust multilayer designs was demonstrated.
