Effect of complexing agent on chemical-mechanical polishing effect of 316L stainless steel

Abstract

To improve the chemical mechanical polishing (CMP) performance of 316L stainless steel, the effect and its mechanism of complexing agent types on the CMP process of 316L stainless steel were studied. The influence of complexing agent types, including glycine, oxalic acid and citric acid, and their concentrations on polishing performance of 316L stainless steel were investigated with material removal rate (MRR) and surface roughness Ra as indexes. Electrochemical workstation, contact angle measuring instrument and X-ray photoelectron spectroscopy (XPS) were performed to analyze the affecting mechanism of complexing agents on 316L stainless steel CMP processing. The results indicated that only when the mass fraction of glycine was 0.2%, both higher MRR of 210 nm/min and lower Ra of 1.613 nm could be obtained. The inhibition effect of complexing agent with high concentration on 316L stainless steel MRR was because the complexing agent enhanced the corrosion resistance and reduced the oxidation rate of 316L stainless steel surface. The XPS results showed that part of glycine complex would be attached on the surface of 316L stainless steel to produce corrosion inhibition.

Keywords

• chemical mechanical polishing
• 316l stainless steel
• complexing agent
• electrochemistry
• fenton reaction