Comparison of the barrier height measurements by the Powell method with the φMS measurement results

Abstract

In this work, we have compared the barrier height measurements carried out using the Powell method with the photoelectric effective contact potential difference (φMS) measurement results. The photoelectric measurements were performed on the samples that were previously applied in the investigation of the influence of stress on the duration of annealing in nitrogen. This paper shows that the results of barrier height measurement using the Powell method differ significantly from the φ(MS) measurement results.

Keywords

• barrier height
• effective contact potential difference
• MOS system