APL Materials (Oct 2015)

Examination of interfacial charge transfer in photocatalysis using patterned CuO thin film deposited on TiO2

  • K. Osako,
  • K. Matsuzaki,
  • H. Hosono,
  • G. Yin,
  • D. Atarashi,
  • E. Sakai,
  • T. Susaki,
  • M. Miyauchi

DOI
https://doi.org/10.1063/1.4926934
Journal volume & issue
Vol. 3, no. 10
pp. 104409 – 104409-5

Abstract

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We examined the interfacial charge transfer effect on photocatalysts using a patterned CuO thin film deposited on a rutile TiO2 (110) substrate. Photocatalytic activity was visualized based on the formation of metal Ag particles resulting from the photoreduction of Ag+ ions under visible-light illumination. Ag particles were selectively deposited near the edge of CuO film for several nanometer thick CuO film, indicating that interfacial excitation from the valence band maximum of TiO2 to the conduction band minimum of CuO plays a key role in efficient photocatalytic activity of CuO nanocluster-grafted TiO2 systems with visible-light sensitivity.