CVD Diamond Film Polishing Method Based on Accelerant Theory and Uniformity Analysis

Abstract

The ultra-precision machining of CVD diamond films is one of the key technologies to expand the application of diamond films. This paper presents a new CVD diamond film polishing method - based on the accelerant theory. The principle is analyzed first. It makes use of transition metal as accelerant to reduce the activation energy required for graphitization, improve reaction rate of graphitization and promote the realization of diamond removal mechanism. Then, the accelerant polishing experimental system is established. In order to explore the influence of the machining speed ratio (k) and eccentric distance (e) on grinding quality, the grinding trajectory simulation analysis is adopted to the CVD diamond samples. The results show when is the motion direction of w1 is same as the w2, CVD diamond sample processing has good uniformity and efficiency as e = 95 mm, k = 0.6; When is the motion direction of w1 is opposite to the w2, CVD diamond sample processing has good uniformity and efficiency as e = 95 mm, k = 0.35.

Keywords

• CVD diamond film
• Accelerant theory
• Machining speed
• Eccentric distance
• Grinding quality.