Polymer brush hypersurface photolithography

Carlos Carbonell; Daniel Valles; Alexa M. Wong; Andrea S. Carlini; Mollie A. Touve; Joanna Korpanty; Nathan C. Gianneschi; Adam B. Braunschweig

doi:10.1038/s41467-020-14990-x

Nature Communications (Mar 2020)

Polymer brush hypersurface photolithography

Carlos Carbonell,
Daniel Valles,
Alexa M. Wong,
Andrea S. Carlini,
Mollie A. Touve,
Joanna Korpanty,
Nathan C. Gianneschi,
Adam B. Braunschweig

Affiliations

Carlos Carbonell: Advanced Science Research Center at the Graduate Center of the City University of New York
Daniel Valles: Advanced Science Research Center at the Graduate Center of the City University of New York
Alexa M. Wong: Advanced Science Research Center at the Graduate Center of the City University of New York
Andrea S. Carlini: Department of Chemistry, Northwestern University
Mollie A. Touve: Department of Chemistry, Northwestern University
Joanna Korpanty: Department of Chemistry, Northwestern University
Nathan C. Gianneschi: Department of Chemistry, Northwestern University
Adam B. Braunschweig: Advanced Science Research Center at the Graduate Center of the City University of New York

DOI: https://doi.org/10.1038/s41467-020-14990-x
Journal volume & issue: Vol. 11, no. 1
pp. 1 – 8

Abstract

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Various lithographic approaches are being explored to create polymer brush patterns with micrometer-scale feature dimensions. Here the authors demonstrate a printing approach which allows independent control of the monomer composition and feature height of each pixel in a pattern, while circumventing the need for expensive photomasks.

Published in Nature Communications

ISSN: 2041-1723 (Online)
Publisher: Nature Portfolio
Country of publisher: United Kingdom
LCC subjects: Science
Website: https://www.nature.com/ncomms/

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