Nitrogen-doped Carbon-based Very Thin Film on Quartz or Sapphire Substrate as Back-side Illuminated Transmission Photocathode

Abstract

Nitrogen-doped carbon-based very thin films were deposited on quartz or sapphire substrate by RF reactive magnetron sputtering using carbon target and gas mixture of Ar and reactive gases N2 or N2+H2. The concentration of elements in the films was determined by RBS and ERD analytical method simultaneously. Carbon-based films surface morphology was examined by scanning electron microscopy. Raman spectroscopy was used for chemical structural properties investigation of carbon films. The photo-electron emission properties were determined by the measurement of cathode bunch charge of prepared back-side pulsed laser illuminated transmission photocathode. Adding hydrogen to gas mixture and changing their flow when carbon films are growth, leads to different results of photo-electron emission properties. Influence of chemical structural properties of N-doped carbon- based very thin films on quartz or sapphire substrates on the photo-induced electron emission of back-side illuminated transmission photocathode are discussed.

Keywords

• carbon very thin film
• magnetron sputtering
• structural properties
• transmission photocathode