Comparison measurements for hybrid evaluation approaches in optical nanometrology

Abstract

In the pursuit of closing the gap between nanometrology and nanofabrication, we investigate the use of advanced optical far field methods for sub-wavelength parameter reconstruction. With the goal of establishing a hybrid evaluation scheme connecting different methods and including different information channels, we performed comparison measurements on a silicon line grating sample with buried as well as not buried surface relief lines. To this end, the results of our measurement are in good agreements with each other, and the collected structure data is feasible to be used for hybrid evaluation.