Dyna (Jul 2019)

Instrumentation and control of an aerosol-assisted chemical vapor deposition system (AACVD)

  • Eduart Yesid Castrillón González,
  • Jorge Mario Hicapie Zapata,
  • Beatriz Cruz Muñoz,
  • Ruben Jose Dorantes Rodriguez,
  • Milton Humberto Medina Barreto

DOI
https://doi.org/10.15446/dyna.v86n210.77344
Journal volume & issue
Vol. 86, no. 210
pp. 52 – 57

Abstract

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Aerosol-assisted chemical vapor deposition (AACVD) is a technique implicates the atomization of a precursor solution into fine droplets which are dragged by a hot air flow throughout mobile nozzle unto heated reaction zone where occurring chemical reactions. In this work, implementation of the mechanical, electrical and electronic components for AACVD in descriptive way is presented. Equipment and experimental methods implemented are described, together to the automatization criteria of nozzle, temperature control of the heating plate and nebulizing system. The flowchart, the logic sequence of the speed control programming and statistical analysis of the nozzle displacement control were completed and checked, therefore an adequate link between the diverse components via Arduino with the design and automatization criteria was achieved. Finally, we conclude that the criteria and automatization process used permitted successfully to make uniform and reproducible coatings.

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