Crystals (Mar 2024)

The Effect of Sputtering Target Density on the Crystal and Electronic Structure of Epitaxial BaTiO<sub>3</sub> Thin Films

  • Fugang Qi,
  • Shaoqin Peng,
  • Jiachang Bi,
  • Shunda Zhang,
  • Guanhua Su,
  • Peiyi Li,
  • Jiahui Zhang,
  • Tengteng Zhang,
  • Weisong Zhou,
  • Ruyi Zhang,
  • Yanwei Cao

DOI
https://doi.org/10.3390/cryst14040304
Journal volume & issue
Vol. 14, no. 4
p. 304

Abstract

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Barium titanate (BaTiO3) is a promising material for silicon-integrated photonics due to its large electro-optical coefficients, low loss, high refractive index, and fast response speed. Several deposition methods have been employed to synthesize BaTiO3 films. Magnetron sputtering is one of these methods, which offers specific advantages for growing large-scale films. However, there is a scarcity of studies investigating the effect of sputtering target density on the quality of BaTiO3 films. Therefore, this study aims to uncover the effect of sputtering targets on the crystal and electronic structures of epitaxial BaTiO3 thin films. Two BaTiO3 ceramic targets were sintered at different densities by altering the sintering temperatures. The crystal structure and chemical composition of the targets were then characterized using X-ray diffraction, Raman spectroscopy, and scanning electron microscopy with energy-dispersive X-ray spectroscopy. Subsequently, BaTiO3 epitaxial films were grown by magnetron sputtering using these two targets. The crystal and electronic structures of the BaTiO3 films were analyzed using high-resolution X-ray diffraction, X-ray photoemission spectroscopy, atomic force microscopy, and spectroscopic ellipsometry. Notably, the BaTiO3 films grown with high-density targets show superior quality but contain oxygen vacancies, whereas those films synthesized with low-density targets display high surface roughness. These findings provide insights into the effect of sputtering target density on the crystal and electronic structures of epitaxial BaTiO3 thin films.

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