Polish Journal of Chemical Technology (Jun 2024)

Enhanced antireflective and laser damage resistance of refractive-index gradient SiO2 nanostructured films at 1064 nm

  • Wan Lili,
  • Yang Jie,
  • Liu Xiaoru,
  • Zhu Jiayi,
  • Xu Gang,
  • Hao Chenchun,
  • Chen Xuecheng,
  • Xiong Zhengwei

DOI
https://doi.org/10.2478/pjct-2024-0014
Journal volume & issue
Vol. 26, no. 2
pp. 25 – 30

Abstract

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A facile sol-gel procedure was employed to create refractive-index gradient SiO2 antireflective (AR) films. A monolayer film, characterized by the porous crosslinking framework, was fabricated with a designed volume ratio mixture both with colloidal silica suspension and soluble organic polysiloxane. The upper layer for the bilayer film was a hexamethylisilazane (HMDS) modified colloidal silica suspension, leading to the film surface transfer to hydrophobic. The strategic design of nanostructures in the bottom and upper layers resulted in a refractive-index gradient SiO2 film with enhanced AR properties. The bilayer film demonstrated a transmittance of 99.5% at 1064 nm, accompanied by a notable reduction in reflectivity. Moreover, the laser-induced damage threshold of the bilayer film was increased by 30%, rising to as high as 24.7 J/cm2. The SiO2 nanostructured film both showed a refractive-index gradient structure with excellent AR properties and exhibited good laser damage resistance.

Keywords