Development of EUV interference lithography for 25 nm line/space patterns

A.K. Sahoo; P.-H. Chen; C.-H. Lin; R.-S. Liu; B.-J. Lin; T.-S. Kao; P.-W. Chiu; T.-P. Huang; W.-Y. Lai; J. Wang; Y.-Y. Lee; C.-K. Kuan

Micro and Nano Engineering (Sep 2023)

Development of EUV interference lithography for 25 nm line/space patterns

A.K. Sahoo,
P.-H. Chen,
C.-H. Lin,
R.-S. Liu,
B.-J. Lin,
T.-S. Kao,
P.-W. Chiu,
T.-P. Huang,
W.-Y. Lai,
J. Wang,
Y.-Y. Lee,
C.-K. Kuan

Affiliations

A.K. Sahoo: NTHU-TSMC Research Center, National Tsing Hua University, Hsinchu, Taiwan; Department of Chemistry, National Tsing Hua University, Hsinchu, Taiwan
P.-H. Chen: College of Semiconductor Research, National Tsing Hua University, Hsinchu, Taiwan
C.-H. Lin: Department of Photonics, National Cheng Kung University, Tainan, Taiwan; Corresponding authors.
R.-S. Liu: College of Semiconductor Research, National Tsing Hua University, Hsinchu, Taiwan; Department of Chemistry, National Tsing Hua University, Hsinchu, Taiwan; Corresponding authors.
B.-J. Lin: NTHU-TSMC Research Center, National Tsing Hua University, Hsinchu, Taiwan; College of Semiconductor Research, National Tsing Hua University, Hsinchu, Taiwan; Corresponding authors.
T.-S. Kao: College of Semiconductor Research, National Tsing Hua University, Hsinchu, Taiwan
P.-W. Chiu: College of Semiconductor Research, National Tsing Hua University, Hsinchu, Taiwan; Department of Electrical Engineering, National Tsing Hua University, Hsinchu, Taiwan
T.-P. Huang: National Synchrotron Radiation Research Center, Hsinchu, Taiwan
W.-Y. Lai: National Synchrotron Radiation Research Center, Hsinchu, Taiwan
J. Wang: National Synchrotron Radiation Research Center, Hsinchu, Taiwan
Y.-Y. Lee: National Synchrotron Radiation Research Center, Hsinchu, Taiwan
C.-K. Kuan: National Synchrotron Radiation Research Center, Hsinchu, Taiwan

Journal volume & issue: Vol. 20
p. 100215

Abstract

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In this study, we present the performance of an extreme ultraviolet interference lithography (EUV-IL) setup that was reconstructed at Taiwan Light Source 21B2 EUV beamline in the National Synchrotron Radiation Research Center (NSRRC), Taiwan. An easy-to-perform fabrication method to produce a high-quality transmission grating mask and a simple design of experimental setup for EUV-IL were developed. The current EUV-IL setup is capable of fabricating line/space patterns down to 25 nm half-pitch in hydrogen silsesquioxane (HSQ) resist. Preliminary exposure results revealed that optimized slit width and exposure time significantly improved line/space pattern quality. The current EUV-IL tool at NSRRC can be used for nano-patterning and resist screening to advance the next generation of semiconductor devices.

Published in Micro and Nano Engineering

ISSN: 2590-0072 (Online)
Publisher: Elsevier
Country of publisher: Netherlands
LCC subjects: Technology: Electrical engineering. Electronics. Nuclear engineering: Electronics; Technology: Technology (General)
Website: https://www.journals.elsevier.com/micro-and-nano-engineering

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