Electron Beam-Induced Reduction of Cuprite

Abstract

Cu-based materials are used in various industries, such as electronics, power generation, and catalysis. In particular, monolayered cuprous oxide (Cu2O) has potential applications in solar cells owing to its favorable electronic and magnetic properties. Atomically thin Cu2O samples derived from bulk cuprite were characterized by high-resolution transmission electron microscopy (HRTEM). Two voltages, 80 kV and 300 kV, were explored for in situ observations of the samples. The optimum electron beam parameters (300 kV, low-current beam) were used to prevent beam damage. The growth of novel crystal structures, identified as Cu, was observed in the samples exposed to isopropanol (IPA) and high temperatures. It is proposed that the exposure of the copper (I) oxide samples to IPA and temperature causes material nucleation, whereas the consequent exposure via e-beams generated from the electron beam promotes the growth of the nanosized Cu crystals.

Keywords

• electron beam irradiation
• cupprite
• catalysis
• HRTEM