Nature Communications (Feb 2020)
Near-field sub-diffraction photolithography with an elastomeric photomask
- Sangyoon Paik,
- Gwangmook Kim,
- Sehwan Chang,
- Sooun Lee,
- Dana Jin,
- Kwang-Yong Jeong,
- I Sak Lee,
- Jekwan Lee,
- Hongjae Moon,
- Jaejun Lee,
- Kiseok Chang,
- Su Seok Choi,
- Jeongmin Moon,
- Soonshin Jung,
- Shinill Kang,
- Wooyoung Lee,
- Heon-Jin Choi,
- Hyunyong Choi,
- Hyun Jae Kim,
- Jae-Hyun Lee,
- Jinwoo Cheon,
- Miso Kim,
- Jaemin Myoung,
- Hong-Gyu Park,
- Wooyoung Shim
Affiliations
- Sangyoon Paik
- Department of Materials Science and Engineering, Yonsei University
- Gwangmook Kim
- Department of Materials Science and Engineering, Yonsei University
- Sehwan Chang
- Department of Physics, Korea University
- Sooun Lee
- Department of Materials Science and Engineering, Yonsei University
- Dana Jin
- Department of Materials Science and Engineering, Yonsei University
- Kwang-Yong Jeong
- Department of Physics, Korea University
- I Sak Lee
- School of Electrical and Electronic Engineering, Yonsei University
- Jekwan Lee
- Department of Physics and Astronomy, and Institute of Applied Physics, Seoul National University
- Hongjae Moon
- Department of Materials Science and Engineering, Yonsei University
- Jaejun Lee
- Department of Materials Science and Engineering, Yonsei University
- Kiseok Chang
- R&D Center, LG Display
- Su Seok Choi
- Department of Electrical Engineering, Pohang University of Science and Technology (POSTECH)
- Jeongmin Moon
- R&D Center, LG Display
- Soonshin Jung
- R&D Center, LG Display
- Shinill Kang
- School of Mechanical Engineering, Yonsei University
- Wooyoung Lee
- Department of Materials Science and Engineering, Yonsei University
- Heon-Jin Choi
- Department of Materials Science and Engineering, Yonsei University
- Hyunyong Choi
- Department of Physics and Astronomy, and Institute of Applied Physics, Seoul National University
- Hyun Jae Kim
- School of Electrical and Electronic Engineering, Yonsei University
- Jae-Hyun Lee
- Center for NanoMedicine, Institute for Basic Science (IBS)
- Jinwoo Cheon
- Center for NanoMedicine, Institute for Basic Science (IBS)
- Miso Kim
- Center for Safety Measurement, Korea Research Institute of Standards and Science (KRISS)
- Jaemin Myoung
- Department of Materials Science and Engineering, Yonsei University
- Hong-Gyu Park
- Department of Physics, Korea University
- Wooyoung Shim
- Department of Materials Science and Engineering, Yonsei University
- DOI
- https://doi.org/10.1038/s41467-020-14439-1
- Journal volume & issue
-
Vol. 11,
no. 1
pp. 1 – 13
Abstract
Photolithography is an established microfabrication technique but commonly uses costly shortwavelength light sources to achieve high resolution. Here the authors use metal patterns embedded in a flexible elastomer photomask with mechanical robustness for generation of subdiffraction patterns as a cost effective near-field optical printing approach.
