Nature Communications (Jun 2021)

Scalable, highly stable Si-based metal-insulator-semiconductor photoanodes for water oxidation fabricated using thin-film reactions and electrodeposition

  • Soonil Lee,
  • Li Ji,
  • Alex C. De Palma,
  • Edward T. Yu

DOI
https://doi.org/10.1038/s41467-021-24229-y
Journal volume & issue
Vol. 12, no. 1
pp. 1 – 10

Abstract

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Authors demonstrate Si-based MIS photoanodes using Al thin-film reactions to create localized conduction paths through the insulator and Ni electrodeposition to form metal catalyst islands. These approaches yielded low onset potential, high saturation current density, and excellent stability.