Coherent Fourier Scatterometry for defect detection on SiC samples

Abstract

Coherent Fourier Scatterometry (CFS) is a scatterometry technique that has been applied for grating and nanoparticle detection. Here, it has been challenged to verify the detectability of the so-called killer defects on SiC samples for power electronic applications. It has been shown that CFS is able to precisely recognize these defects regardless of their shape or size. CFS could be considered as a possible alternative for this purpose.