Frontiers in Materials (Aug 2021)

Research on Improving the Working Current of NbOx-Based Selector by Inserting a Ti Layer

  • Chunlei Liu,
  • Guokun Ma,
  • Junpeng Zeng,
  • Qiuyang Tan,
  • Ziqi Zhang,
  • Ao Chen,
  • Nengfan Liu,
  • Houzhao Wan,
  • Baoyuan Wang,
  • Li Tao,
  • Yiheng Rao,
  • Liangping Shen,
  • Hanbin Wang,
  • Jun Zhang,
  • Hao Wang

DOI
https://doi.org/10.3389/fmats.2021.716065
Journal volume & issue
Vol. 8

Abstract

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To achieve the highest possible integration storage density in the V-point structure, the working current of the selector in the one-selection one-resistance (1S1R) structure should match with the resistance random access memory (RRAM). In this study, a selector device is designed with a Ti/NbOx/Ti/Pt structure through the magnetron sputtering method and achieves excellent performance of threshold switching under ultra-large compliance current (CC) up to 100 mA. Furthermore, both the switching voltages and the OFF-state resistance of the device demonstrate excellent stability even when CC is increased to a milliampere level, attributed from the existence of metallic NbO in the switching layer. This study provides evidence that a Ti/NbOx/Ti/Pt device has a great potential to drive RRAM in the V-point structure.

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