Tuning of Schottky barrier height using oxygen-inserted (OI) layers and fluorine implantation

Xi Zhang; Hideki Takeuchi; Daniel Connelly; Marek Hytha; Robert J. Mears; Leonard M. Rubin; Tsu-Jae King Liu

doi:10.1063/1.5144507

AIP Advances (Jun 2020)

Tuning of Schottky barrier height using oxygen-inserted (OI) layers and fluorine implantation

Xi Zhang,
Hideki Takeuchi,
Daniel Connelly,
Marek Hytha,
Robert J. Mears,
Leonard M. Rubin,
Tsu-Jae King Liu

Affiliations

Xi Zhang: Department of Electrical Engineering and Computer Sciences, University of California, Berkeley, California 94720, USA
Hideki Takeuchi: Atomera, Inc., Los Gatos, California 95035, USA
Daniel Connelly: Atomera, Inc., Los Gatos, California 95035, USA
Marek Hytha: Atomera, Inc., Los Gatos, California 95035, USA
Robert J. Mears: Atomera, Inc., Los Gatos, California 95035, USA
Leonard M. Rubin: Axcelis Technologies, Inc., Beverly, Massachusetts 01915, USA
Tsu-Jae King Liu: Department of Electrical Engineering and Computer Sciences, University of California, Berkeley, California 94720, USA

DOI: https://doi.org/10.1063/1.5144507
Journal volume & issue: Vol. 10, no. 6
pp. 065310 – 065310-8

Abstract

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The effects of oxygen-insertion technology and low-energy fluorine (F) implantation on the Schottky barrier height (ΦBp) of a Pt/Ti/p-type Si metal–semiconductor contact are studied via electrical characterizations of Schottky diodes, physical analyses by secondary ion mass spectrometry , and chemical analyses by x-ray photoelectron spectroscopy. It is found that both oxygen-inserted (OI) layers and F can reduce ΦBp due to Ti 2p and Si 2p binding energy shifts before forming gas anneal (FGA) and due to retarded Pt diffusion into Si (facilitating low-ΦBp Pt mono-silicide formation) during FGA. The experimental findings also suggest that OI layers are more effective than F for reducing ΦBp.

Published in AIP Advances

ISSN: 2158-3226 (Online)
Publisher: AIP Publishing LLC
Country of publisher: United States
LCC subjects: Science: Physics
Website: http://aipadvances.aip.org/

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