Simultaneous fabrication of line and dot dual nanopatterns using miktoarm block copolymer with photocleavable linker

Chungryong Choi; Jichoel Park; Kanniyambatti L. Vincent Joseph; Jaeyong Lee; Seonghyeon Ahn; Jongheon Kwak; Kyu Seong Lee; Jin Kon Kim

doi:10.1038/s41467-017-02019-9

Nature Communications (Nov 2017)

Simultaneous fabrication of line and dot dual nanopatterns using miktoarm block copolymer with photocleavable linker

Chungryong Choi,
Jichoel Park,
Kanniyambatti L. Vincent Joseph,
Jaeyong Lee,
Seonghyeon Ahn,
Jongheon Kwak,
Kyu Seong Lee,
Jin Kon Kim

Affiliations

Chungryong Choi: National Creative Research Center for Block Copolymer Self-Assembly, Department of Chemical Engineering, Pohang University of Science and Technology
Jichoel Park: National Creative Research Center for Block Copolymer Self-Assembly, Department of Chemical Engineering, Pohang University of Science and Technology
Kanniyambatti L. Vincent Joseph: National Creative Research Center for Block Copolymer Self-Assembly, Department of Chemical Engineering, Pohang University of Science and Technology
Jaeyong Lee: National Creative Research Center for Block Copolymer Self-Assembly, Department of Chemical Engineering, Pohang University of Science and Technology
Seonghyeon Ahn: National Creative Research Center for Block Copolymer Self-Assembly, Department of Chemical Engineering, Pohang University of Science and Technology
Jongheon Kwak: National Creative Research Center for Block Copolymer Self-Assembly, Department of Chemical Engineering, Pohang University of Science and Technology
Kyu Seong Lee: National Creative Research Center for Block Copolymer Self-Assembly, Department of Chemical Engineering, Pohang University of Science and Technology
Jin Kon Kim: National Creative Research Center for Block Copolymer Self-Assembly, Department of Chemical Engineering, Pohang University of Science and Technology

DOI: https://doi.org/10.1038/s41467-017-02019-9
Journal volume & issue: Vol. 8, no. 1
pp. 1 – 8

Abstract

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Block copolymers that form nanodomains and are used in nanolithography usually do not form nanopatterns with multiple shapes. Here the authors report a block copolymer that allows for UV- induced cleavage of one arm and demonstrate the transformation of the cylindrical to the lamellar nanodomain.

Published in Nature Communications

ISSN: 2041-1723 (Online)
Publisher: Nature Portfolio
Country of publisher: United Kingdom
LCC subjects: Science
Website: https://www.nature.com/ncomms/

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