Fabrication of a 4 m SiC Aspheric Mirror Using an Optimized Strategy of Dividing an Error Map

Abstract

This paper introduces an optimization strategy for fabricating large aspheric mirrors. We polished a large SiC aspheric mirror, 4 m in diameter, achieving a surface error of 1/40λ RMS. To the best of our knowledge, this is the first instance of such a result for a mirror of this material and size combination. Due to the various performance settings of different tools, achieving optimal polishing results with a single setting is challenging. We evaluated the performance of various tool settings and developed an optimization strategy, dividing error maps to enhance efficiency in large-aperture aspheric mirror fabrication. We established the relationship between tool size and its error control capability. The residual error map of the mirror was divided into two parts using Zernike polynomial expansion based on the frequency order of the error map. Here, we used the first 36 terms of the Zernike polynomial fit to define a low-order error map, and the residual error was used to define a high-order error map. Large tools were used to correct the low-order frequency error map, whereas small tools were used to correct the high-order frequency error map. Therefore, the original residual error map could be corrected with significantly high efficiency. By employing this strategy, we fabricated a 4 m SiC aspheric mirror in 18 months, achieving a final surface error better than 0.024λ RMS.

Keywords

• computer-controlled polishing
• silicon carbide mirror
• dwell time algorithm
• low-frequency error
• high-frequency error
• error map dividing strategy