Simulation of Laser-Heating and Energetic Plasma Plume Expansion in Pulsed Laser Deposition of Y₃Fe₅O₁₂

Abstract

In the present study, numerically iterative models are employed to study two processes involved in the pulsed laser deposition of an Y3Fe5O12 target. The 1D conduction heat model is used to evaluate the temperature of the target irradiated by a nano-second pulse laser, taking into account the plasma shielding effect. Further, the gas dynamics model is employed to simulate the kinetic of plasma plume expansion. The results may be important in obtaining high-quality Y3Fe5O12 thin films.

Keywords

• pulsed laser deposition
• Y₃Fe₅O₁₂
• plasma dynamics