Effect of X-ray irradiation on threshold voltage of AlGaN/GaN HEMTs with p-GaN and MIS Gates

Abstract

Commercially available AlGaN/GaN high-electron-mobility transistors (HEMTs) are beginning to enter the public scene from a range of suppliers. Based on previous studies, commercial GaN-based electronics are expected to be tolerant to different types of irradiation in space. To test this assumption, we compared the characteristic electrical curves obtained at different X-ray irradiation doses for GaN HEMT devices manufactured by Infineon and Transphorm. The p-GaN-based device was found to be more robust with a stable threshold voltage, whereas the threshold voltage of the device with a metal-insulator-semiconductor gate was found to shift first in the negative and then the positive direction. This dynamic phenomenon is caused by the releasing and trapping effects of radiation-induced charges in the dielectric layer and at the interface of irradiated devices. As such, the p-GaN-gate-based GaN HEMT provides a promising solution for use as an electric source in space.

Keywords

• p-GaN gate
• GaN HEMTs
• X-ray irradiation
• Threshold voltage