Effect of Cu Ions Implantation on Structural, Electronic, Optical and Dielectric Properties of Polymethyl Methacrylate (PMMA)

Abstract

In this work, the effect of ion bombardment on the optical properties of Polymethylmethacrylate (PMMA) was studied. Polymer samples were implanted with 500 keV Cu+ ions with a fluence ranging from 1 × 1012 to 1 × 1014 ions/cm2. X-ray Diffractometer (XRD) study indicated a relatively lower variation with a higher dose of ions. Fourier Transform Infrared (FTIR) spectra exhibited that with the implantation of Cu ions the intensity of existing bands decreases, while the result confirms the existence of a C=C group. The pristine and ion-implanted samples were also investigated using photoluminescence (PL) and Ultra Violet-Visible (UV-VIS) spectra. The optical band gap (Eg) was observed up to 3.05 eV for the implanted samples, while the pristine sample exhibited a wide energy-gap up to ~3.9 eV. The change in the optical gap indicated the presence of a gradual phase transition for the polymer blends. The dielectric measurements of the pristine and Cu-implanted PMMA were investigated in the 10 Hz to 2 GHz frequency range. It was found that the implanted samples showed a significant decrease in the value of the dielectric constant. The value of the dielectric constant and dielectric loss of the PMMA and Cu-implanted samples at a 1-kHz frequency were found to be ~300 and 29, respectively. The modification of the PMMA energy bandgap in the current research suggested the potential use of Cu implanted PMMA in the field of optical communications and flexible electronic devices.

Keywords

• PMMA
• Cu implantation
• optical properties
• optoelectronic applications