Study of Exposure Uniformity of UV LED Exposure System for Wafer-Level Camera Lenses

Abstract

Wafer-level camera lenses are a very promising process for camera lens fabrication. However, there exist some problems with this technology, such as uneven exposure due to curing non-uniformities. In this study, an optical simulation was implemented to simulate the UV light-emitting diodes (LEDs) curing process. We design the LED arrangement, and then find the corresponding LED and adjust the LED power to improve exposure uniformity. The simulation results are very close to the experimental data, and the uniformity is also within the standard range.

Keywords

• wafer-level lens
• exposure uniformity
• uv led curing