Dissolution and Passivation Mechanism of Chalcopyrite during Pressurized Water Leaching

Abstract

In this study, chemical leaching, XRD, SEM, and XPS analyses were conducted to investigate the dissolution and passivation mechanisms of chalcopyrite under pressurized oxidative conditions in water. The chemical leaching results showed that the chalcopyrite could be dissolved by pressurized leaching without any acid addition, i.e., in an O2–H2O system, and the copper leaching rate reached 96.4% under the optimal conditions of 180 °C, 1.5 MPa, 900 rpm, and 90 min. The XRD, SEM, and XPS data suggested that a large proportion of the chalcopyrite dissolved in solution via the mineral phase transformation of CuFeS2→Cu2+ and CuFeS2→CuS→Cu2+, i.e., some of the chalcopyrite directly leached into solution as Cu2+, and some of it was first converted to CuS and then to Cu2+. The primary passivation layers during the chalcopyrite pressurized water leaching were hematite, pyrite, and covellite; however, none of them covered the un-leached mineral surface or inhibited chalcopyrite dissolution, as long as the agitation speed and leaching time were maintained over 700 rpm and 60 min, respectively. Finally, a model of chalcopyrite’s dissolution and passivation mechanism during pressurized water leaching was proposed.

Keywords

• chalcopyrite
• water
• pressurized leaching
• mechanisms
• passivation