Unveiling high-temperature stability and growth dynamics of CVD-SiOC coatings across different deposition conditions and environments

Abstract

In this study, we systematically investigated the high-temperature protection performance and evolution behavior of three different SiOC coatings (1050SiOC, 1100SiOC, 1150SiOC) under different atmospheres. The coatings were prepared by the organometallic chemical vapor deposition (CVD) method and characterized using scanning electron microscopy (SEM), grazing incidence x-ray diffraction (GIXRD), x-ray photoelectron spectroscopy (XPS) techniques. It was found that the composition and microstructure of SiOC coatings, environmental atmosphere, and heat treatment temperature can affect the thermal stability and high-temperature reaction mechanism of SiOC coatings. Further, it was revealed that the three SiOC coatings only exhibit the same high-temperature evolution behavior and reaction mechanism in an air environment while exhibiting different high-temperature evolution behavior and reaction mechanisms in both an inert atmosphere and a reduced air atmosphere. Among the coatings prepared, the 1050SiOC coating demonstrated the highest on-set oxidation temperature under identical oxygen content conditions. This characteristic may contribute to the coating’s excellent resistance to high-temperature oxidation.

Keywords

• SiOC coating
• CVD
• high-temperature stability
• high-temperature growth dynamics