Materials (May 2024)

Advanced Computational Analysis of Cobalt-Based Superalloys through Crystal Plasticity

  • Shahriyar Keshavarz,
  • Carelyn E. Campbell,
  • Andrew C. E. Reid

DOI
https://doi.org/10.3390/ma17102458
Journal volume & issue
Vol. 17, no. 10
p. 2458

Abstract

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This study introduces an advanced computational method aimed at accelerating continuum-scale processes using crystal plasticity approaches to predict mechanical responses in cobalt-based superalloys. The framework integrates two levels, namely, sub-grain and homogenized, at the meso-scale through crystal plasticity finite element (CPFE) platforms. The model is applicable across a temperature range from room temperature up to 900 °C, accommodating various dislocation mechanisms in the microstructure. The sub-grain level explicitly incorporates precipitates and employs a dislocation density-based constitutive model that is size-dependent. In contrast, the homogenized level utilizes an activation energy-based constitutive model, implicitly representing the γ′ phase for efficiency in computations. This level considers the effects of composition and morphology on mechanical properties, demonstrating the potential for cobalt-based superalloys to rival nickel-based superalloys. The study aims to investigate the impacts of elements including tungsten, tantalum, titanium, and chromium through the homogenized constitutive model. The model accounts for the locking mechanism to address the cross-slip of screw dislocations at lower temperatures as well as the glide and climb mechanism to simulate diffusions at higher temperatures. The model’s validity is established across diverse compositions and morphologies, as well as various temperatures, through comparison with experimental data. This advanced computational framework not only enables accurate predictions of mechanical responses in cobalt-based superalloys across a wide temperature range, but also provides valuable insights into the design and optimization of these materials for high-temperature applications.

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