Cryo-Focused Ion Beam-Induced Deposition of Tungsten–Carbon Nanostructures Using a Thermoelectric Plate

Abstract

Focused Ion Beam-Induced Deposition (FIBID) is a single-step nanopatterning technique that applies a focused beam of ions to induce the decomposition of a gaseous precursor. The processing rate of FIBID increases by two orders of magnitude when the process is performed at cryogenic temperatures (Cryo-FIBID): the precursor forms a condensed layer on the surface of the cooled substrate, greatly enhancing the amount of material available for decomposition. Cryo-FIBID has been achieved so far by making use of liquid nitrogen-based cooling circuits, which require the passage of a flowing gas as a cooling agent. Here, the Cryo-FIBID of the W(CO)6 precursor is performed using a coolant-free thermoelectric plate utilizing the Peltier effect. Performed at −60 ∘C, the procedure yields a W–C-based material with structural and electrical properties comparable to those of its counterpart grown in coolant-based Cryo-FIBID. The use of the thermoelectric plate significantly reduces the vibrations and sample drift induced by the flow of passing coolant gas and allows for the fabrication of similar nanostructures. In summary, the reported process represents a further step towards the practical implementation of the Cryo-FIBID technique, and it will facilitate its use by a broader research community.

Keywords

• focused ion beam
• nanofabrication
• direct-write growth
• tungsten–carbon nanostructures
• cryogenic nanolithography