Modern Electronic Materials (Sep 2020)

Effect of surface charge self-organization on gate-induced 2D electron and hole systems

  • Vitaly A. Tkachenko,
  • Olga A. Tkachenko,
  • Dmitry G. Baksheev,
  • Oleg P. Sushkov

DOI
https://doi.org/10.3897/j.moem.6.3.63361
Journal volume & issue
Vol. 6, no. 3
pp. 101 – 106

Abstract

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A simple model has been suggested for describing self-organization of localized charges and quantum scattering in undoped GaAs/AlGaAs structures with 2D electron or hole gas created by applying respective gate bias. It has been assumed that these metal / dielectric / undoped semiconductor structures exhibit predominant carrier scattering at localized surface charges which can be located at any point of the plane imitating the GaAs / dielectric interface. The suggested model considers all these surface charges and respective image charges in metallic gate as a closed thermostated system. Electrostatic self-organization in this system has been studied numerically for thermodynamic equilibrium states using the Metropolis algorithm over a wide temperature range. We show that at T > 100 K a simple formula derived from the theory of single-component 2D plasma yields virtually the same behavior of structural factor at small wave numbers as the one given by the Metropolis algorithm. The scattering times of gate-induced carriers are described with formulas in which the structural factor characterizes frozen disorder in the system. The main contribution in these formulas is due to behavior of the structural factor at small wave numbers. Calculation using these formulas for the case of disorder corresponding to infinite T has yielded 2–3 times lower scattering times than experimentally obtained ones. We have found that the theory agrees with experiment at disorder freezing temperatures T ≈ 1000 K for 2D electron gas specimen and T ≈ 700 K for 2D hole gas specimen. These figures are the upper estimates of freezing temperature for test structures since the model ignores all the disorder factors except temperature.