CONSIDERATIONS ABOUT COOPER ETCHING BY PHOTOCHEMICAL MACHINING

Abstract

In this paper is studied the copper etching by Photochemical Machining (PCM). The work –piece material is shaped by using a strong chemical solution to dissolve the metallic material that was selectively exposed to machine areas using photographic techniques. Copper etching is the main process in the printed circuit board manufacturing. Ferric chloride (FeCl3) and copper chloride (CuCl2) are the best etch agents for copper and copper alloys. The etching efficiency was analyzed by comparing the etch rate for different concentrations of the two etch agents.

Keywords

• photochemical machining
• photo-resist
• etchant
• etch rate