Rapid, noncontact, sensitive, and semiquantitative characterization of buffered hydrogen-fluoride-treated silicon wafer surfaces by terahertz emission spectroscopy

Dongxun Yang; Abdul Mannan; Fumikazu Murakami; Masayoshi Tonouchi

doi:10.1038/s41377-022-01033-x

Light: Science & Applications (Nov 2022)

Rapid, noncontact, sensitive, and semiquantitative characterization of buffered hydrogen-fluoride-treated silicon wafer surfaces by terahertz emission spectroscopy

Dongxun Yang,
Abdul Mannan,
Fumikazu Murakami,
Masayoshi Tonouchi

Affiliations

Dongxun Yang: Institute of Laser Engineering, Osaka University 2-6 Yamadaoka, Suita
Abdul Mannan: Institute of Laser Engineering, Osaka University 2-6 Yamadaoka, Suita
Fumikazu Murakami: Institute of Laser Engineering, Osaka University 2-6 Yamadaoka, Suita
Masayoshi Tonouchi: Institute of Laser Engineering, Osaka University 2-6 Yamadaoka, Suita

DOI: https://doi.org/10.1038/s41377-022-01033-x
Journal volume & issue: Vol. 11, no. 1
pp. 1 – 12

Abstract

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In this paper, the THz emission properties from Si wafers with different surface conditions and doping conditions have been concluded, which show the potential application of LTEM on surface estimation

Published in Light: Science & Applications

ISSN: 2047-7538 (Online)
Publisher: Nature Publishing Group
Country of publisher: United Kingdom
LCC subjects: Technology: Engineering (General). Civil engineering (General): Applied optics. Photonics; Science: Physics: Optics. Light
Website: https://www.nature.com/lsa/

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