AIP Advances (Jun 2016)
Microfabrication of large-area circular high-stress silicon nitride membranes for optomechanical applications
- E. Serra,
- M. Bawaj,
- A. Borrielli,
- G. Di Giuseppe,
- S. Forte,
- N. Kralj,
- N. Malossi,
- L. Marconi,
- F. Marin,
- F. Marino,
- B. Morana,
- R. Natali,
- G. Pandraud,
- A. Pontin,
- G. A. Prodi,
- M. Rossi,
- P. M. Sarro,
- D. Vitali,
- M. Bonaldi
Affiliations
- E. Serra
- Istituto Nazionale di Fisica Nucleare, TIFPA, 38123 Povo (TN), Italy
- M. Bawaj
- Physics Division, School of Science and Technology, Università di Camerino, 62032 Camerino (MC), Italy
- A. Borrielli
- Istituto Nazionale di Fisica Nucleare, TIFPA, 38123 Povo (TN), Italy
- G. Di Giuseppe
- Physics Division, School of Science and Technology, Università di Camerino, 62032 Camerino (MC), Italy
- S. Forte
- Delft University of Technology, Else Kooi Laboratory, 2628 Delft, The Netherlands
- N. Kralj
- Physics Division, School of Science and Technology, Università di Camerino, 62032 Camerino (MC), Italy
- N. Malossi
- Physics Division, School of Science and Technology, Università di Camerino, 62032 Camerino (MC), Italy
- L. Marconi
- Dipartimento di Fisica e Astronomia, Università di Firenze, Via Sansone 1, 50019 Sesto Fiorentino (FI), Italy
- F. Marin
- Dipartimento di Fisica e Astronomia, Università di Firenze, Via Sansone 1, 50019 Sesto Fiorentino (FI), Italy
- F. Marino
- INFN, Sezione di Firenze, Via Sansone 1, 50019 Sesto Fiorentino (FI), Italy
- B. Morana
- Delft University of Technology, Else Kooi Laboratory, 2628 Delft, The Netherlands
- R. Natali
- Physics Division, School of Science and Technology, Università di Camerino, 62032 Camerino (MC), Italy
- G. Pandraud
- Delft University of Technology, Else Kooi Laboratory, 2628 Delft, The Netherlands
- A. Pontin
- Dipartimento di Fisica e Astronomia, Università di Firenze, Via Sansone 1, 50019 Sesto Fiorentino (FI), Italy
- G. A. Prodi
- Istituto Nazionale di Fisica Nucleare, TIFPA, 38123 Povo (TN), Italy
- M. Rossi
- Physics Division, School of Science and Technology, Università di Camerino, 62032 Camerino (MC), Italy
- P. M. Sarro
- Delft University of Technology, Else Kooi Laboratory, 2628 Delft, The Netherlands
- D. Vitali
- Physics Division, School of Science and Technology, Università di Camerino, 62032 Camerino (MC), Italy
- M. Bonaldi
- Istituto Nazionale di Fisica Nucleare, TIFPA, 38123 Povo (TN), Italy
- DOI
- https://doi.org/10.1063/1.4953805
- Journal volume & issue
-
Vol. 6,
no. 6
pp. 065004 – 065004-8
Abstract
In view of the integration of membrane resonators with more complex MEMS structures, we developed a general fabrication procedure for circular shape SiNx membranes using Deep Reactive Ion Etching (DRIE). Large area and high-stress SiNx membranes were fabricated and used as optomechanical resonators in a Michelson interferometer, where Q values up to 1.3 × 106 were measured at cryogenic temperatures, and in a Fabry-Pérot cavity, where an optical finesse up to 50000 has been observed.
