Fluorination-enhanced photoconductive effect in a wide band gap Ca3Ti2O7-x F x thin films

Hao Lu; Yang Yang; Zhongshen Luo; Sihui Wu; Yanda Ji; Yang Li; Jinlei Zhang; Guozhen Liu; Yucheng Jiang; Hao Yang; Chunlan Ma; Run Zhao; Ju Gao

doi:10.1088/2053-1591/abd0a4

Materials Research Express (Jan 2020)

Fluorination-enhanced photoconductive effect in a wide band gap Ca3Ti2O7-x F x thin films

Hao Lu,
Yang Yang,
Zhongshen Luo,
Sihui Wu,
Yanda Ji,
Yang Li,
Jinlei Zhang,
Guozhen Liu,
Yucheng Jiang,
Hao Yang,
Chunlan Ma,
Run Zhao,
Ju Gao

Affiliations

Hao Lu: Institute of Materials Science & Devices, School of Materials Science and Engineering, Suzhou University of Science and Technology , Suzhou, 215009, People’s Republic of China
Yang Yang: Jiangsu Key Laboratory of Micro and Nano Heat Fluid Flow Technology and Energy Application, School of Physical Science and Technology, Suzhou University of Science and Technology , Suzhou 215009, People’s Republic of China
Zhongshen Luo: Jiangsu Key Laboratory of Micro and Nano Heat Fluid Flow Technology and Energy Application, School of Physical Science and Technology, Suzhou University of Science and Technology , Suzhou 215009, People’s Republic of China
Sihui Wu: Jiangsu Key Laboratory of Micro and Nano Heat Fluid Flow Technology and Energy Application, School of Physical Science and Technology, Suzhou University of Science and Technology , Suzhou 215009, People’s Republic of China
Yanda Ji: ORCiD; Department of Applied Physics, Nanjing University of Aeronautics and Astronautics , Nanjing 210016, People’s Republic of China
Yang Li: Jiangsu Key Laboratory of Micro and Nano Heat Fluid Flow Technology and Energy Application, School of Physical Science and Technology, Suzhou University of Science and Technology , Suzhou 215009, People’s Republic of China
Jinlei Zhang: ORCiD; Jiangsu Key Laboratory of Micro and Nano Heat Fluid Flow Technology and Energy Application, School of Physical Science and Technology, Suzhou University of Science and Technology , Suzhou 215009, People’s Republic of China
Guozhen Liu: ORCiD; Jiangsu Key Laboratory of Micro and Nano Heat Fluid Flow Technology and Energy Application, School of Physical Science and Technology, Suzhou University of Science and Technology , Suzhou 215009, People’s Republic of China
Yucheng Jiang: Jiangsu Key Laboratory of Micro and Nano Heat Fluid Flow Technology and Energy Application, School of Physical Science and Technology, Suzhou University of Science and Technology , Suzhou 215009, People’s Republic of China
Hao Yang: Department of Applied Physics, Nanjing University of Aeronautics and Astronautics , Nanjing 210016, People’s Republic of China
Chunlan Ma: Jiangsu Key Laboratory of Micro and Nano Heat Fluid Flow Technology and Energy Application, School of Physical Science and Technology, Suzhou University of Science and Technology , Suzhou 215009, People’s Republic of China
Run Zhao: ORCiD; Jiangsu Key Laboratory of Micro and Nano Heat Fluid Flow Technology and Energy Application, School of Physical Science and Technology, Suzhou University of Science and Technology , Suzhou 215009, People’s Republic of China
Ju Gao: School of Optoelectronic Engineering, Zaozhuang University , Zaozhuang 277160, People’s Republic of China

DOI: https://doi.org/10.1088/2053-1591/abd0a4
Journal volume & issue: Vol. 7, no. 12
p. 126402

Abstract

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In this work, Ca _3 Ti _2 O _7- _x F _x thin films on (110) SrTiO _3 substrates were prepared by two steps as deposited via pulsed laser deposition and fluorinated with polyvinylidene fluoride. Despite the unchanged crystal structure of the fluorinated films, the changed valence state can be used to confirm the incorporation of F ^−1 and the weakened chemical bond of Ca–O. Furthermore, we found that the photoelectric switch can be observed at a wide range of light wavelength from 405 nm to 808 nm. It is found that the photosensitivity of 4 × 10 ^4 (405 nm) in the fluorine has been increased by two orders of magnitude, which is most likely due to the deep energy levels in the reduced band gap of 2.3 eV. This work paves the way for the enhanced photoconductive devices via the anionic defect engineering.

Published in Materials Research Express

ISSN: 2053-1591 (Online)
Publisher: IOP Publishing
Country of publisher: United Kingdom
LCC subjects: Technology: Electrical engineering. Electronics. Nuclear engineering: Materials of engineering and construction. Mechanics of materials; Technology: Chemical technology
Website: https://iopscience.iop.org/journal/2053-1591

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