Effects of forming gas annealing on luminescence properties of erbium silicate thin films

Abstract

While hydrogen passivation has led to enhanced luminescence in many erbium doped materials, its effects on Er oxides/silicates compounds has rarely been demonstrated. Here we report effects of forming gas annealing on the luminescence properties in such Er compound materials. A broad band photoluminescence in the ultraviolet/visible range, likely arising from structural defects in the material, is significantly suppressed after forming gas annealing. Concurrently, the Er near-infrared luminescence intensity and its lifetime increase by about a factor of two and three, respectively. The samples are further characterized with Rutherford backscattering for composition information, optical absorption for optically excitable Er concentrations and extended x-ray absorption fine structures for Er local environments. We discuss the hydrogen passivation effects in the context of diffusion limited relaxation processes and suggest pathways to further improving near-infrared luminescence properties in Er compound materials.