Single-Domain and Atomically Flat Surface of κ‑Ga2O3 Thin Films on FZ-Grown ε‑GaFeO3 Substrates via Step-Flow Growth Mode

• Hiroyuki Nishinaka,
• Osamu Ueda,
• Daisuke Tahara,
• Yusuke Ito,
• Noriaki Ikenaga,
• Noriyuki Hasuike,
• Masahiro Yoshimoto

Affiliations

Hiroyuki Nishinaka

Faculty of Electrical Engineering and Electronics, Kyoto Institute of Technology, Kyoto, Japan

Osamu Ueda

Meiji Renewable Energy Laboratory, Meiji University, Kawasaki, Kanagawa, Japan

Daisuke Tahara

Department of Electronics, Kyoto Institute of Technology, Kyoto, Japan

Yusuke Ito

Department of Electronics, Kyoto Institute of Technology, Kyoto, Japan

Noriaki Ikenaga

Kanazawa Institute of Technology, Nonoichi, Ishikawa, Japan

Noriyuki Hasuike

Faculty of Electrical Engineering and Electronics, Kyoto Institute of Technology, Kyoto, Japan

Masahiro Yoshimoto

Faculty of Electrical Engineering and Electronics, Kyoto Institute of Technology, Kyoto, Japan