Author Correction: Effect of bias potential and dimension on electrochemical migration of capacitors for implantable devices

• Shiyao Du,
• Feng Li,
• Flemming Bjerg Grumsen,
• Rajan Ambat,
• Ao Tang,
• Ying Li

Affiliations

Shiyao Du

Institute of Metal Research, Chinese Academy of Sciences

Feng Li

Section of Materials and Surface Engineering, Department of Civil and Mechanical Engineering, Technical University of Denmark, Kgs

Flemming Bjerg Grumsen

Section of Materials and Surface Engineering, Department of Civil and Mechanical Engineering, Technical University of Denmark, Kgs

Rajan Ambat

Section of Materials and Surface Engineering, Department of Civil and Mechanical Engineering, Technical University of Denmark, Kgs

Ao Tang

Institute of Metal Research, Chinese Academy of Sciences

Ying Li

Institute of Metal Research, Chinese Academy of Sciences