Applied Physics Express (Jan 2024)
Self-traceable angle standards with simplified traceability chain for dimensional metrology
- Xiao Deng,
- Junyu Shen,
- Yingfan Xiong,
- Jinming Gou,
- Zhaohui Tang,
- Guangxu Xiao,
- Zhijun Yin,
- Dongbai Xue,
- Yushu Shi,
- Zhoumiao Shi,
- Yuying Xie,
- Xinbin Cheng,
- Tongbao Li
Affiliations
- Xiao Deng
- National Metrology and Testing Center for Integrated Circuit Measurement and Inspection Equipment Industry (Shanghai), Tongji University , Shanghai 200092, People’s Republic of China; Institute of Precision Optical Engineering, Tongji University , Shanghai 200092, People’s Republic of China; MOE Key Laboratory of Advanced Micro-Structured Materials, Tongji University , Shanghai 200092, People’s Republic of China; Shanghai Frontiers Science Center of Digital Optics, Tongji University , Shanghai 200092, People’s Republic of China; Shanghai Professional Technical Service Platform for Full-Spectrum and High-Performance Optical Thin Film Devices and Applications, Tongji University , Shanghai 200092, People’s Republic of China; School of Physics Science and Engineering, Tongji University , Shanghai 200092, People’s Republic of China
- Junyu Shen
- National Metrology and Testing Center for Integrated Circuit Measurement and Inspection Equipment Industry (Shanghai), Tongji University , Shanghai 200092, People’s Republic of China; Institute of Precision Optical Engineering, Tongji University , Shanghai 200092, People’s Republic of China; MOE Key Laboratory of Advanced Micro-Structured Materials, Tongji University , Shanghai 200092, People’s Republic of China; Shanghai Frontiers Science Center of Digital Optics, Tongji University , Shanghai 200092, People’s Republic of China; Shanghai Professional Technical Service Platform for Full-Spectrum and High-Performance Optical Thin Film Devices and Applications, Tongji University , Shanghai 200092, People’s Republic of China; School of Physics Science and Engineering, Tongji University , Shanghai 200092, People’s Republic of China
- Yingfan Xiong
- National Metrology and Testing Center for Integrated Circuit Measurement and Inspection Equipment Industry (Shanghai), Tongji University , Shanghai 200092, People’s Republic of China; Institute of Precision Optical Engineering, Tongji University , Shanghai 200092, People’s Republic of China; MOE Key Laboratory of Advanced Micro-Structured Materials, Tongji University , Shanghai 200092, People’s Republic of China; Shanghai Frontiers Science Center of Digital Optics, Tongji University , Shanghai 200092, People’s Republic of China; Shanghai Professional Technical Service Platform for Full-Spectrum and High-Performance Optical Thin Film Devices and Applications, Tongji University , Shanghai 200092, People’s Republic of China; School of Physics Science and Engineering, Tongji University , Shanghai 200092, People’s Republic of China
- Jinming Gou
- National Metrology and Testing Center for Integrated Circuit Measurement and Inspection Equipment Industry (Shanghai), Tongji University , Shanghai 200092, People’s Republic of China; Institute of Precision Optical Engineering, Tongji University , Shanghai 200092, People’s Republic of China; MOE Key Laboratory of Advanced Micro-Structured Materials, Tongji University , Shanghai 200092, People’s Republic of China; Shanghai Frontiers Science Center of Digital Optics, Tongji University , Shanghai 200092, People’s Republic of China; Shanghai Professional Technical Service Platform for Full-Spectrum and High-Performance Optical Thin Film Devices and Applications, Tongji University , Shanghai 200092, People’s Republic of China; School of Physics Science and Engineering, Tongji University , Shanghai 200092, People’s Republic of China
- Zhaohui Tang
- National Metrology and Testing Center for Integrated Circuit Measurement and Inspection Equipment Industry (Shanghai), Tongji University , Shanghai 200092, People’s Republic of China; Institute of Precision Optical Engineering, Tongji University , Shanghai 200092, People’s Republic of China; MOE Key Laboratory of Advanced Micro-Structured Materials, Tongji University , Shanghai 200092, People’s Republic of China; Shanghai Frontiers Science Center of Digital Optics, Tongji University , Shanghai 200092, People’s Republic of China; Shanghai Professional Technical Service Platform for Full-Spectrum and High-Performance Optical Thin Film Devices and Applications, Tongji University , Shanghai 200092, People’s Republic of China; School of Physics Science and Engineering, Tongji University , Shanghai 200092, People’s Republic of China
- Guangxu Xiao
- National Metrology and Testing Center for Integrated Circuit Measurement and Inspection Equipment Industry (Shanghai), Tongji University , Shanghai 200092, People’s Republic of China; Institute of Precision Optical Engineering, Tongji University , Shanghai 200092, People’s Republic of China; MOE Key Laboratory of Advanced Micro-Structured Materials, Tongji University , Shanghai 200092, People’s Republic of China; Shanghai Frontiers Science Center of Digital Optics, Tongji University , Shanghai 200092, People’s Republic of China; Shanghai Professional Technical Service Platform for Full-Spectrum and High-Performance Optical Thin Film Devices and Applications, Tongji University , Shanghai 200092, People’s Republic of China; School of Physics Science and Engineering, Tongji University , Shanghai 200092, People’s Republic of China
- Zhijun Yin
- National Metrology and Testing Center for Integrated Circuit Measurement and Inspection Equipment Industry (Shanghai), Tongji University , Shanghai 200092, People’s Republic of China; Institute of Precision Optical Engineering, Tongji University , Shanghai 200092, People’s Republic of China; MOE Key Laboratory of Advanced Micro-Structured Materials, Tongji University , Shanghai 200092, People’s Republic of China; Shanghai Frontiers Science Center of Digital Optics, Tongji University , Shanghai 200092, People’s Republic of China; Shanghai Professional Technical Service Platform for Full-Spectrum and High-Performance Optical Thin Film Devices and Applications, Tongji University , Shanghai 200092, People’s Republic of China; School of Physics Science and Engineering, Tongji University , Shanghai 200092, People’s Republic of China
- Dongbai Xue
- National Metrology and Testing Center for Integrated Circuit Measurement and Inspection Equipment Industry (Shanghai), Tongji University , Shanghai 200092, People’s Republic of China; Institute of Precision Optical Engineering, Tongji University , Shanghai 200092, People’s Republic of China; MOE Key Laboratory of Advanced Micro-Structured Materials, Tongji University , Shanghai 200092, People’s Republic of China; Shanghai Frontiers Science Center of Digital Optics, Tongji University , Shanghai 200092, People’s Republic of China; Shanghai Professional Technical Service Platform for Full-Spectrum and High-Performance Optical Thin Film Devices and Applications, Tongji University , Shanghai 200092, People’s Republic of China; School of Physics Science and Engineering, Tongji University , Shanghai 200092, People’s Republic of China
- Yushu Shi
- National Institute of Metrology, Beijing 100029, People’s Republic of China; Shenzhen Institute for Technology Innovation, National Institute of Metrology, Shenzhen 518107, People’s Republic of China
- Zhoumiao Shi
- Shenzhen Institute for Technology Innovation, National Institute of Metrology, Shenzhen 518107, People’s Republic of China
- Yuying Xie
- National Metrology and Testing Center for Integrated Circuit Measurement and Inspection Equipment Industry (Shanghai), Tongji University , Shanghai 200092, People’s Republic of China; Institute of Precision Optical Engineering, Tongji University , Shanghai 200092, People’s Republic of China; MOE Key Laboratory of Advanced Micro-Structured Materials, Tongji University , Shanghai 200092, People’s Republic of China; Shanghai Frontiers Science Center of Digital Optics, Tongji University , Shanghai 200092, People’s Republic of China; Shanghai Professional Technical Service Platform for Full-Spectrum and High-Performance Optical Thin Film Devices and Applications, Tongji University , Shanghai 200092, People’s Republic of China; School of Physics Science and Engineering, Tongji University , Shanghai 200092, People’s Republic of China
- Xinbin Cheng
- National Metrology and Testing Center for Integrated Circuit Measurement and Inspection Equipment Industry (Shanghai), Tongji University , Shanghai 200092, People’s Republic of China; Institute of Precision Optical Engineering, Tongji University , Shanghai 200092, People’s Republic of China; MOE Key Laboratory of Advanced Micro-Structured Materials, Tongji University , Shanghai 200092, People’s Republic of China; Shanghai Frontiers Science Center of Digital Optics, Tongji University , Shanghai 200092, People’s Republic of China; Shanghai Professional Technical Service Platform for Full-Spectrum and High-Performance Optical Thin Film Devices and Applications, Tongji University , Shanghai 200092, People’s Republic of China; School of Physics Science and Engineering, Tongji University , Shanghai 200092, People’s Republic of China
- Tongbao Li
- National Metrology and Testing Center for Integrated Circuit Measurement and Inspection Equipment Industry (Shanghai), Tongji University , Shanghai 200092, People’s Republic of China; Institute of Precision Optical Engineering, Tongji University , Shanghai 200092, People’s Republic of China; MOE Key Laboratory of Advanced Micro-Structured Materials, Tongji University , Shanghai 200092, People’s Republic of China; Shanghai Frontiers Science Center of Digital Optics, Tongji University , Shanghai 200092, People’s Republic of China; Shanghai Professional Technical Service Platform for Full-Spectrum and High-Performance Optical Thin Film Devices and Applications, Tongji University , Shanghai 200092, People’s Republic of China; School of Physics Science and Engineering, Tongji University , Shanghai 200092, People’s Republic of China
- DOI
- https://doi.org/10.35848/1882-0786/ad87a9
- Journal volume & issue
-
Vol. 17,
no. 11
p. 115001
Abstract
Traceability is a fundamental issue for ensuring accuracy of nanometrology. A shortened traceability chain is advantageous for reducing calibration steps, thus reducing errors and raising application efficiency. A novel kind of two-dimensional grating is manufactured by atom lithography, whose pitch and (orthogonal) angle values are directly determined by natural constants, offering a feasible approach for effectively shortening the traceability chain. The PTB’s calibration results show that the two-dimensional grating has excellent orthogonality with a deviation of only 0.001°. The application of two-dimensional grating is demonstrated for the characterization of the angular distortion of a SEM, showing its great application potential.
Keywords
- dimensional metrology
- shortened angle traceability chain
- atom lithography
- 2D self-traceable grating
- SEM calibration
