Dynamics and universal scaling law in geometrically-controlled sessile drop evaporation

P. J. Sáenz; A. W. Wray; Z. Che; O. K. Matar; P. Valluri; J. Kim; K. Sefiane

doi:10.1038/ncomms14783

Nature Communications (Mar 2017)

Dynamics and universal scaling law in geometrically-controlled sessile drop evaporation

P. J. Sáenz,
A. W. Wray,
Z. Che,
O. K. Matar,
P. Valluri,
J. Kim,
K. Sefiane

Affiliations

P. J. Sáenz: Department of Mathematics, Massachusetts Institute of Technology
A. W. Wray: Department of Chemical Engineering, Imperial College London
Z. Che: Department of Chemical Engineering, Imperial College London
O. K. Matar: Department of Chemical Engineering, Imperial College London
P. Valluri: School of Engineering, The University of Edinburgh
J. Kim: Department of Mechanical Engineering, The University of Maryland
K. Sefiane: School of Engineering, The University of Edinburgh

DOI: https://doi.org/10.1038/ncomms14783
Journal volume & issue: Vol. 8, no. 1
pp. 1 – 9

Abstract

Read online

Drop evaporation can be used as a fabrication technology for targeted particle deposition or microflow control, yet previous research is limited to spherical drops. Here, Sáenzet al. generalize the evaporation dynamics for arbitrary drop geometry and show its potential for more sophisticated control.

Published in Nature Communications

ISSN: 2041-1723 (Online)
Publisher: Nature Portfolio
Country of publisher: United Kingdom
LCC subjects: Science
Website: https://www.nature.com/ncomms/

About the journal