Engineering high quality graphene superlattices via ion milled ultra-thin etching masks

Abstract

Focused-ion beam (FIB) lithography enables high-resolution nanopatterning of 2D materials, but usually introduces significant damage. Here, the authors report a FIB-based fabrication technique to obtain high quality graphene superlattices with 18-nm pitch, which exhibit electronic transport properties similar to those of natural moiré systems.