Efficient Structure Transformation Based on Sensitivity-Oriented Structure Adjustment for Inverse-Designed Devices

Abstract

Inverse-designed devices with thousands of degrees of freedom could achieve high performance in compact footprints, but typically have complex structure topologies that contain many irregular and tiny features and sharp corners, which tend to lead to a poor robustness to fabrication errors. In order to effectively transform the structure of inverse-designed nanophotonic devices into simple structure topologies that have high robustness to fabrication errors without sacrificing device performance, in this paper, we propose a structure adjustment method that innovatively adjusts the structures of inverse-designed devices by introducing their structural sensitivity to the optical performance, extracting the device substructures with high sensitivity and eliminating those with low sensitivity, and, finally, transforming the device structures into simple structure topologies with high robustness and better performance. Two devices (90° crossing and T-junction) were designed and fabrication tolerance simulation was conducted to verify the method. The results show that the devices designed using the proposed method achieved better performance and were more robust to under/over-etched errors.

Keywords

• nanophotonics
• inverse design
• structure transformation
• fabrication robustness
• structural sensitivity
• active contour model