Nanophotonics (May 2024)

Enhancing metasurface fabricability through minimum feature size enforcement

  • Terekhov Pavel,
  • Chang Shengyuan,
  • Rahman Md Tarek,
  • Shafi Sadman,
  • Ahn Hyun-Ju,
  • Zhao Linghan,
  • Ni Xingjie

DOI
https://doi.org/10.1515/nanoph-2024-0150
Journal volume & issue
Vol. 13, no. 17
pp. 3147 – 3154

Abstract

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The metasurfaces have shown great potential for miniaturizing conventional optics while offering extended flexibility. Recently, there has been considerable interest in using algorithms to generate meta-atom shapes for these metasurfaces, as they offer vast design freedom and not biased by the human intuition. However, these complex designs significantly increase the difficulty of fabrication. To address this, we introduce a design process that rigorously enforces the fabricability of both the material-filled (fill) and empty (void) regions in a metasurface design. This process takes into account specific constraints regarding the minimum feature size for each region. Additionally, it corrects any violations of these constraints across the entire device, ensuring only minimal impact on performance. Our method provides a practical way to create metasurface designs that are easy to fabricate, even with complex shapes, hence improving the overall production yield of these advanced meta-optical components.

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