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Nature Communications
(Jan 2023)
Publisher Correction: Gradient area-selective deposition for seamless gap-filling in 3D nanostructures through surface chemical reactivity control
Chi Thang Nguyen,
Eun-Hyoung Cho,
Bonwook Gu,
Sunghee Lee,
Hae-Sung Kim,
Jeongwoo Park,
Neung-Kyung Yu,
Sangwoo Shin,
Bonggeun Shong,
Jeong Yub Lee,
Han-Bo-Ram Lee
Affiliations
Chi Thang Nguyen
Department of Materials Science and Engineering, Incheon National University
Eun-Hyoung Cho
Beyond Silicon Lab, Samsung Advanced Institute of Technology
Bonwook Gu
Department of Materials Science and Engineering, Incheon National University
Sunghee Lee
Beyond Silicon Lab, Samsung Advanced Institute of Technology
Hae-Sung Kim
Beyond Silicon Lab, Samsung Advanced Institute of Technology
Jeongwoo Park
Department of Chemical Engineering, Hongik University
Neung-Kyung Yu
Department of Chemical Engineering, Hongik University
Sangwoo Shin
Department of Mechanical and Aerospace Engineering, University at Buffalo
Bonggeun Shong
Department of Chemical Engineering, Hongik University
Jeong Yub Lee
Beyond Silicon Lab, Samsung Advanced Institute of Technology
Han-Bo-Ram Lee
Department of Materials Science and Engineering, Incheon National University
DOI
https://doi.org/10.1038/s41467-023-35883-9
Journal volume & issue
Vol. 14, no. 1
pp. 1 – 1
Abstract
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No abstracts available.
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