On‐Chip Arrayed Waveguide Grating Fabricated on Thin‐Film Lithium Niobate

Abstract

Herein, an on‐chip 8‐channel thin‐film lithium niobate (TFLN) arrayed waveguide grating (AWG) is designed and the device is fabricated using photolithography‐assisted chemo‐mechanical etching technique. The transmission of the fabricated TFLN AWG near the central wavelength of 1550 nm is experimentally measured. An on‐chip loss as low as 3.32 dB, a single‐channel bandwidth of 1.6 nm, and a total‐channel bandwidth of 12.8 nm are obtained. The cross talk between adjacent channels is measured to be below −3.83 dB within the wavelength range from 1543 to 1558 nm, and the cross talk between nonadjacent channels is below −15 dB.

Keywords

• arrayed waveguide gratings
• photonic integrated circuits
• thin-film lithium niobate