Charge Transport inside TiO₂ Memristors Prepared via FEBID

Abstract

We fabricated memristive devices using focused electron beam-induced deposition (FEBID) as a direct-writing technique employing a Pt/TiO2/Pt sandwich layer device configuration. Pinching in the measured current-voltage characteristics (i-v), the characteristic fingerprint of memristive behavior was clearly observed. The temperature dependence was measured for both high and low resistive states in the range from 290 K down to about 2 K, showing a stretched exponential behavior characteristic of Mott-type variable-range hopping. From this observation, a valence change mechanism of the charge transport inside the TiO2 layer can be deduced.

Keywords

• memristor
• FEBID
• titanium dioxide
• resistive switching
• SEM image
• current-voltage (<i>i-v</i>) curves