Thin films sputter-deposited from EUROFER97 in argon and deuterium atmosphere: Material properties and deuterium retention

E. Pitthan; P. Petersson; T.T. Tran; D. Moldarev; R. Kaur; J. Shams-Latifi; P. Ström; M. Hans; M. Rubel; D. Primetzhofer

Nuclear Materials and Energy (Mar 2023)

Thin films sputter-deposited from EUROFER97 in argon and deuterium atmosphere: Material properties and deuterium retention

E. Pitthan,
P. Petersson,
T.T. Tran,
D. Moldarev,
R. Kaur,
J. Shams-Latifi,
P. Ström,
M. Hans,
M. Rubel,
D. Primetzhofer

Affiliations

E. Pitthan: Department of Physics and Astronomy, Ångström Laboratory, Uppsala University, Box 516, SE-751 20 Uppsala, Sweden; Corresponding author.
P. Petersson: Department of Fusion Plasma Physics, KTH Royal Institute of Technology, 10044, Stockholm, Teknikringen 31, Sweden
T.T. Tran: Department of Physics and Astronomy, Ångström Laboratory, Uppsala University, Box 516, SE-751 20 Uppsala, Sweden
D. Moldarev: Department of Physics and Astronomy, Ångström Laboratory, Uppsala University, Box 516, SE-751 20 Uppsala, Sweden
R. Kaur: Department of Physics and Astronomy, Ångström Laboratory, Uppsala University, Box 516, SE-751 20 Uppsala, Sweden
J. Shams-Latifi: Department of Physics and Astronomy, Ångström Laboratory, Uppsala University, Box 516, SE-751 20 Uppsala, Sweden
P. Ström: Department of Physics and Astronomy, Ångström Laboratory, Uppsala University, Box 516, SE-751 20 Uppsala, Sweden
M. Hans: Materials Chemistry, RWTH Aachen University, Kopernikusstraße 10, 52074 Aachen, Germany
M. Rubel: Department of Physics and Astronomy, Ångström Laboratory, Uppsala University, Box 516, SE-751 20 Uppsala, Sweden; Department of Fusion Plasma Physics, KTH Royal Institute of Technology, 10044, Stockholm, Teknikringen 31, Sweden
D. Primetzhofer: Department of Physics and Astronomy, Ångström Laboratory, Uppsala University, Box 516, SE-751 20 Uppsala, Sweden

Journal volume & issue: Vol. 34
p. 101375

Abstract

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Sputter-deposited thin films (33–1160 nm) from EUROFER97 were obtained on different substrates (C, Si, W, MgO) in argon and a mix of argon and deuterium atmosphere. The composition, microstructure, and mechanical properties of the films were analyzed and compared to those of the bulk material. The films feature lower density (-10%), higher hardness (+79%), and smaller crystallites in comparison to the bulk. Despite such differences, the elemental atomic composition of the films and the bulk was very similar, as determined by ion beam analysis. Deposition in deuterium-containing atmosphere resulted in a low deuterium incorporation (0.28% of atomic content), indicating low retention of hydrogen-isotopes in the deposited material.

Published in Nuclear Materials and Energy

ISSN: 2352-1791 (Online)
Publisher: Elsevier
Country of publisher: United Kingdom
LCC subjects: Technology: Electrical engineering. Electronics. Nuclear engineering: Nuclear engineering. Atomic power
Website: http://www.journals.elsevier.com/nuclear-materials-and-energy/

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