Retraction Note: Large-Area Semiconducting Graphene Nanomesh Tailored by Interferometric Lithography

Affiliations

Alireza Kazemi: Center for High Technology Materials, University of New Mexico
Xiang He: Center for High Technology Materials, University of New Mexico
Seyedhamidreza Alaie: Center for High Technology Materials, University of New Mexico
Javad Ghasemi: Center for High Technology Materials, University of New Mexico
Noel Mayur Dawson: Center for High Technology Materials, University of New Mexico
Francesca Cavallo: Center for High Technology Materials, University of New Mexico
Terefe G. Habteyes: Center for High Technology Materials, University of New Mexico
Steven R. J. Brueck: Center for High Technology Materials, University of New Mexico
Sanjay Krishna: Center for High Technology Materials, University of New Mexico

Abstract

Editor's Note: this Article has been retracted; the Retraction Note is available at https://doi.org/10.1038/s41598-021-84101-3 .